XPS study of CeO2/Al2O3 film

Journal of University of Science and Technology Beijing: Mineral Metallurgy Materials (Eng Ed)

Volumn 6, Issue 3, 1999, Pages 199-204

  Zhang, Mei ^a   Liu, Zhenxiang ^b   Xie, Kan ^b   Du, Xueyan ^a   Li, Wenchao ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b INSTITUTE OF PHYSICS   (China)

Author keywords

CeO2 Al2O3 thin film; Interaction; Redox; XPS

Indexed keywords

EID: 33746774662     PISSN: 10058850     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

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