Shift dependent skew quadrupole in advanced light source elliptically polarizing undulators, cause and corrections

IEEE Transactions on Applied Superconductivity

Volumn 16, Issue 2, 2006, Pages 1574-1577

  Marks, S ^a   Prestemon, S ^a   Schlueter, R D ^a   Steier, C ^a   Wolski, A ^a   Jung, J Y ^a   Chubar, O ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b Synchrotron Sololeil   (France)

Author keywords

Elliptically polarizing undulator; Permanent magnets; Skew quadrupole

Indexed keywords

ELECTRON BEAMS; ERROR ANALYSIS; MAGNETIC FIELD EFFECTS; MAGNETIC FIELDS; POLARIZATION; PRODUCT DESIGN;

ELLIPTICALLY POLARIZING UNDULATOR; MAGNETIC BLOCK DISPLACEMENTS; MECHANICAL MEASUREMENTS; SKEW QUADRUPOLE;

PERMANENT MAGNETS;

EID: 33746645652     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/TASC.2005.869665     Document Type: Conference Paper

References (5)

1. S. Marks et al., "The advanced light source elliptically polarizing undulator," in Proc. 1997 PAC, Vancouver, 1998, p. 3221.
2. S. Sasaki, "Analysis of a planar variably polarizing undulator," Nucl. Instr. And Meth., vol. A 347, p. 83, 1994.
3. C. Steier, "Study of row phase dependent skew quadrupole fields in Apple-II Type EPU's at the ALS," in Proc. 2004 EPAC, Lucerne, Switzerland.
4. J. Chavanne et al., "End field structure for linear/helical insertion devices," in Proc. 1999 PAC, New York, 1999.
5. O. Chubar et al., "A 3D magnetostatics computer code for insertion devices," J. Synch. Rad, vol. 5, p. 481, 1998.