Increased ferroelastic domain mobility in ferroelectric thin films and its use in nano-patterned capacitors

Nanotechnology

Volumn 17, Issue 13, 2006, Pages 3154-3159

  Le Rhun, G ^a   Vrejoiu, I ^a   Pintilie, L ^a   Hesse, D ^a   Alexe, M ^a   Gosele U ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; CAPACITORS; ELECTRIC FIELDS; ELECTRODES; EPITAXIAL GROWTH; FERROELECTRIC MATERIALS; LEAD; PIEZOELECTRICITY; SENSORS; SUBSTRATES; TITANIUM; ZIRCONIUM;

DOMAIN WALLS; ELASTIC PROPERTIES; NON-UNIFORM ELECTRIC FIELD; PIEZORESPONSE FORCE MICROSCOPY (PFM);

THIN FILMS;

EID: 33746613757     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/17/13/013     Document Type: Article

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