Internal drift effects on the diffusion of Ag in CdTe

Journal of Electronic Materials

Volumn 35, Issue 6, 2006, Pages 1350-1353

  Wolf, H ^a   Wagner, F ^a   Wiehert, Th ^a   Grill, R ^b   Belas, E ^b  

^a SAARLAND UNIVERSITY   (Germany)

^b CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Deviation from stoichiometry; Diffusion; Drift; Internal electric field

Indexed keywords

DEVIATION FROM STOICHIOMETRY; DRIFT; INTERNAL ELECTRIC FIELD;

ANNEALING; CADMIUM; CRYSTALLINE MATERIALS; DIFFUSION; DOPING (ADDITIVES); SEMICONDUCTING TELLURIUM; STOICHIOMETRY;

SILVER;

EID: 33746255427     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-006-0267-x     Document Type: Conference Paper

References (7)

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