Outgassing properties of chemically polished titanium materials

Shinku/Journal of the Vacuum Society of Japan

Volumn 49, Issue 4, 2006, Pages 254-258

  Kurisu, Hiroki ^a   Kimoto, Gou ^c   Fujii, Hiroaki ^c   Tanaka, Kazuhiko ^c   Yamamoto, Setsuo ^a   Matsuura, Mitsuru ^a   Ishizawa, Katsunobu ^b   Nomura, Takeru ^b   Murashige, Nobuyuki ^b  

^a YAMAGUCHI UNIVERSITY   (Japan)

^b San ai Plant Construction Ltd   (Japan)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

MECHANOCHEMICALLY POLISHED (MCP); THERMAL DESORPTION; TRANSMISSION ELECTRON MICROGRAPH; VACUUM MATERIALS;

ATOMIC FORCE MICROSCOPY; CHEMICAL POLISHING; DEGASSING; TRANSMISSION ELECTRON MICROSCOPY; ULTRAHIGH VACUUM; VACUUM APPLICATIONS;

TITANIUM;

EID: 33746082401     PISSN: 05598516     EISSN: None     Source Type: Journal    
DOI: 10.3131/jvsj.49.254     Document Type: Article

References (9)