Atomic force microscopy and x-ray photoelectron spectroscopy studies of ZnO nanoparticles on SiO2 fabricated by ion implantation and thermal oxidation

Applied Physics Letters

Volumn 89, Issue 2, 2006, Pages

  Amekura, H ^a   Plaksin, O A ^a   Yoshitake, M ^a   Takeda, Y ^a   Kishimoto, N ^a   Buchal, Ch ^b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; FABRICATION; ION IMPLANTATION; MORPHOLOGY; NANOSTRUCTURED MATERIALS; OXYGEN; SILICA; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

DOMELIKE STRUCTURES; RADIATION-INDUCED SMOOTHING; THERMAL OXIDATION;

ZINC OXIDE;

EID: 33746065285     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2221507     Document Type: Article

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