|
Volumn 1, Issue 2, 2006, Pages 230-237
|
Property of nano-SiO2/urea formaldehyde resin
|
Author keywords
Bonding strength; Free formaldehyde; Nanometer silicon dioxide; Urea formaldehyde (UF) resin; X ray photoelectronic spectrum (XPS)
|
Indexed keywords
|
EID: 33746060538
PISSN: 16733517
EISSN: 16733630
Source Type: Journal
DOI: 10.1007/s11461-006-0024-6 Document Type: Article |
Times cited : (56)
|
References (14)
|