Nanostructured and conventional YSZ coatings deposited using APS and TTPR techniques

Surface and Coatings Technology

Volumn 201, Issue 1-2, 2006, Pages 338-346

  Racek, O ^a   Berndt, C C ^b   Guru, D N ^c   Heberlein, J ^c  

^a Stony Brook University   (United States)

^b JAMES COOK UNIVERSITY   (Australia)

^c UNIVERSITY OF MINNESOTA   (United States)

Author keywords

Microscopy; Nanostructure; Thermal barrier coating; Thermal spray; Zirconia

Indexed keywords

DEPOSITION; ELECTRON MICROSCOPY; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PLASMA TORCHES; POROSITY; SINTERING; THERMAL BARRIER COATINGS; YTTRIUM COMPOUNDS;

CONVENTIONAL YSZ; NANOSTRUCTURED YTTRIA STABILIZED ZIRCONIA (NANO-YSZ); THERMAL SPRAY; TRIPLE TORCH PLASMA REACTOR (TTPR);

PLASMA SPRAYING;

DEPOSITION; ELECTRON MICROSCOPY; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PLASMA SPRAYING; PLASMA TORCHES; POROSITY; SINTERING; THERMAL BARRIER COATINGS; YTTRIUM COMPOUNDS;

EID: 33745936143     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.11.122     Document Type: Article

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