Effect of deposition conditions on the microstructure and gas-sensing characteristics of Te thin films

Materials Science and Engineering: B

Volumn 131, Issue 1-3, 2006, Pages 156-161

  Bhandarkar, Vinit ^a   Sen, Shashwati ^a   Muthe, K P ^a   Kaur, Manmeet ^a   Kumar, M Senthil ^b   Deshpande, S K ^a   Gupta, S K ^a   Yakhmi, J V ^a   Sahni, V C ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

Author keywords

Gas sensor; H2S; Microstructure; NO2; Tellurium thin film

Indexed keywords

CRYSTAL GROWTH; DEPOSITION; GRAIN SIZE AND SHAPE; MICROSTRUCTURE; POLYCRYSTALLINE MATERIALS; SENSITIVITY ANALYSIS; TELLURIUM COMPOUNDS;

CARCONV; H2S; NO2; TELLURIUM THIN FILM;

THIN FILMS;

EID: 33745862408     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2006.04.017     Document Type: Article

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