Preparation of PbTiO3 thin films by Liquid Source Misted Chemical Vapor Deposition (LSMCVD) method

Journal of the Ceramic Society of Japan

Volumn 114, Issue 1331, 2006, Pages 603-606

  Kim, Bok Hee ^a,c   Moon, Ji Won ^b   Song, Young Deuk ^a   Mizutani, Nobuyasu ^d   Shinozaki, Kazuo ^b  

^a Chonbuk National University   (South Korea)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c Research Institute of Advanced Materials Development   (South Korea)

^d TOKYO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Epitaxial growth; Ferroelectrics; LSMCVD; Thin film

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FERROELECTRIC MATERIALS; LEAD COMPOUNDS; PERMITTIVITY; POLYCRYSTALLINE MATERIALS; SYNTHESIS (CHEMICAL);

LSMCVD; SOLUTION CONCENTRATION;

THIN FILMS;

EID: 33745851097     PISSN: 09145400     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj.114.603     Document Type: Article

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