Megasonic silicon wafer cleaning and its influence on LSI devices

Solid State Phenomena

Volumn 76-77, Issue , 2001, Pages 235-240

  Tomozawa, Akihiro ^a   Ohnishi, Akihiro ^a   Kinoshita, Hideo ^a   Nakano, Takashi ^a  

^a Hitachi Tohbu Semiconductor Ltd   (Japan)

Author keywords

Megasonics; Schlieren method; Single wafer cleaning

Indexed keywords

LSI CIRCUITS; POWER CONTROL; SILICON WAFERS;

DAMAGE CONTROL; HIGH FREQUENCY HF; MEGASONIC CLEANING; MEGASONICS; POWER DENSITIES; SCHLIEREN METHOD; SINGLE-WAFER CLEANING; WAFER CLEANING;

CLEANING;

EID: 33745760692     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.76-77.235     Document Type: Conference Paper

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