-
1
-
-
0029389357
-
-
S. Nakamura, M. Senoh, N. Iwasa, S. Nagahama, T. Yamada, and T. Mukai, Jpn. J. Appl. Phys., Part 2 34, L1332 (1995).
-
(1995)
Jpn. J. Appl. Phys., Part 2
, vol.34
-
-
Nakamura, S.1
Senoh, M.2
Iwasa, N.3
Nagahama, S.4
Yamada, T.5
Mukai, T.6
-
3
-
-
2342513370
-
-
Chen-Fu Chu, Fang-I Lai, Jung-Tang Chu, Chang-Chin Yu, Chia-Feng Lin, Hao-Chung Kuo, and S. C. Wang, J. Appl. Phys. 95, 3916 (2004).
-
(2004)
J. Appl. Phys.
, vol.95
, pp. 3916
-
-
Chu, C.-F.1
Lai, F.-I.2
Chu, J.-T.3
Yu, C.-C.4
Lin, C.-F.5
Kuo, H.-C.6
Wang, S.C.7
-
4
-
-
0000339975
-
-
William S. Wong, Michael Kneissl, Ping Mei, David W. Treat, Mark Teepe, and Noble M. Johnson, Appl. Phys. Lett. 78, 1198 (2001).
-
(2001)
Appl. Phys. Lett.
, vol.78
, pp. 1198
-
-
Wong, W.S.1
Kneissl, M.2
Mei, P.3
Treat, D.W.4
Teepe, M.5
Johnson, N.M.6
-
6
-
-
79956003488
-
-
J. Ohta, H. Fujioka, S. Ito, and M. Oshima, Appl. Phys. Lett. 81, 2373 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 2373
-
-
Ohta, J.1
Fujioka, H.2
Ito, S.3
Oshima, M.4
-
7
-
-
1842855248
-
-
A. Kobayashi, H. Fujioka, J. Ohta, and M. Oshima, Jpn. J. Appl. Phys., Part 2 43, L53 (2004).
-
(2004)
Jpn. J. Appl. Phys., Part 2
, vol.43
-
-
Kobayashi, A.1
Fujioka, H.2
Ohta, J.3
Oshima, M.4
-
8
-
-
27944502481
-
-
Y. Kawaguchi, J. Ohta, A. Kobayashi, and H. Fujioka, Appl. Phys. Lett. 87, 221907 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 221907
-
-
Kawaguchi, Y.1
Ohta, J.2
Kobayashi, A.3
Fujioka, H.4
-
9
-
-
0035546272
-
-
J. Ohta, H. Fujioka, H. Takahashi, M. Sumiya, and M. Oshima, J. Cryst. Growth 233, 779 (2001).
-
(2001)
J. Cryst. Growth
, vol.233
, pp. 779
-
-
Ohta, J.1
Fujioka, H.2
Takahashi, H.3
Sumiya, M.4
Oshima, M.5
-
10
-
-
0037155430
-
-
H. Takahashi, J. Ohta, H. Fujioka, and M. Oshima, Thin Solid Films 407, 114 (2002).
-
(2002)
Thin Solid Films
, vol.407
, pp. 114
-
-
Takahashi, H.1
Ohta, J.2
Fujioka, H.3
Oshima, M.4
-
11
-
-
1842635428
-
-
J. Ohta, H. Fujioka, H. Takahashi, and M. Oshima, Phys. Status Solidi A 188, 497 (2001).
-
(2001)
Phys. Status Solidi A
, vol.188
, pp. 497
-
-
Ohta, J.1
Fujioka, H.2
Takahashi, H.3
Oshima, M.4
-
12
-
-
17044451447
-
-
J. Ohta, H. Fujioka, H. Takahashi, and M. Oshima, Appl. Surf. Sci. 197/198, 486 (2002).
-
(2002)
Appl. Surf. Sci.
, vol.197-198
, pp. 486
-
-
Ohta, J.1
Fujioka, H.2
Takahashi, H.3
Oshima, M.4
-
13
-
-
0035338092
-
-
J. Ohta, H. Fujioka, M. Sumiya, H. Koinuma, H. Takahashi, and M. Oshima, J. Cryst. Growth 225, 73 (2001).
-
(2001)
J. Cryst. Growth
, vol.225
, pp. 73
-
-
Ohta, J.1
Fujioka, H.2
Sumiya, M.3
Koinuma, H.4
Takahashi, H.5
Oshima, M.6
-
14
-
-
0038070080
-
-
S. Ito, J. Ohta, H. Fujioka, H. Takahashi, and M. Oshima, Thin Solid Films 435, 215 (2003).
-
(2003)
Thin Solid Films
, vol.435
, pp. 215
-
-
Ito, S.1
Ohta, J.2
Fujioka, H.3
Takahashi, H.4
Oshima, M.5
-
15
-
-
0242335969
-
-
J. Ohta, H. Fujioka, M. Oshima, K. Fujiwara, and A. Ishii, Appl. Phys. Lett. 83, 3075 (2003).
-
(2003)
Appl. Phys. Lett.
, vol.83
, pp. 3075
-
-
Ohta, J.1
Fujioka, H.2
Oshima, M.3
Fujiwara, K.4
Ishii, A.5
-
19
-
-
33644895189
-
-
S. Inoue, K. Okamoto, N. Matsuki, Tae-Won Kim, and H. Fujioka, J. Cryst. Growth 289, 574 (2006).
-
(2006)
J. Cryst. Growth
, vol.289
, pp. 574
-
-
Inoue, S.1
Okamoto, K.2
Matsuki, N.3
Kim, T.-W.4
Fujioka, H.5
-
20
-
-
0037319437
-
-
K. Umezawa, H. Takaoka, S. Hirayama, S. Nakanishi, and W. M. Gibson, Curr. Appl. Phys. 3, 71 (2003).
-
(2003)
Curr. Appl. Phys.
, vol.3
, pp. 71
-
-
Umezawa, K.1
Takaoka, H.2
Hirayama, S.3
Nakanishi, S.4
Gibson, W.M.5
-
21
-
-
36449000082
-
-
D. Blanc, A. M. Bouchoux, C. Plumereau, A. Cachard, and J. F. Roux, Appl. Phys. Lett. 66, 659 (1995).
-
(1995)
Appl. Phys. Lett.
, vol.66
, pp. 659
-
-
Blanc, D.1
Bouchoux, A.M.2
Plumereau, C.3
Cachard, A.4
Roux, J.F.5
-
22
-
-
0345669113
-
-
M. J. Bergmann, Ü. Özgür, H. C. Casey, Jr., H. O. Everitt, and J. F. Muth, Appl. Phys. Lett. 75, 67 (1999).
-
(1999)
Appl. Phys. Lett.
, vol.75
, pp. 67
-
-
Bergmann, M.J.1
Özgür, Ü.2
Casey Jr., H.C.3
Everitt, H.O.4
Muth, J.F.5
|