-
1
-
-
0033892819
-
Ultra-thin elevated channel poly-Si TFT technology for fully-integrated AMLCD system on glass
-
May
-
S. Zhang, C. Zhu, J. K. O. Sin, J. N. Li, and P. K. T. Mok, "Ultra-thin elevated channel poly-Si TFT technology for fully-integrated AMLCD system on glass," IEEE Trans. Electron Devices, vol. 47, no. 5, pp. 569-575, May 2000.
-
(2000)
IEEE Trans. Electron Devices
, vol.47
, Issue.5
, pp. 569-575
-
-
Zhang, S.1
Zhu, C.2
Sin, J.K.O.3
Li, J.N.4
Mok, P.K.T.5
-
2
-
-
0033882049
-
High performance low temperature metal-induced unilaterally crystallized polycrystalline silicon thin film transistors for system-on-panel applications
-
May
-
Z. Meng, M. Wang, and M. Wong, "High performance low temperature metal-induced unilaterally crystallized polycrystalline silicon thin film transistors for system-on-panel applications," IEEE Trans. Electron Devices, vol. 47, no. 5, pp. 404-409, May 2000.
-
(2000)
IEEE Trans. Electron Devices
, vol.47
, Issue.5
, pp. 404-409
-
-
Meng, Z.1
Wang, M.2
Wong, M.3
-
3
-
-
0034322586
-
Effect of grain boundaries on hot-carrier induced degradation in large grain polysilicon thin-film transistors
-
C. A. Dimitriadis, M. Kimura, M. Miyasaka, S. Inoue, F. V. Farmakis, J. Brini, and G. Kamarinos, "Effect of grain boundaries on hot-carrier induced degradation in large grain polysilicon thin-film transistors," Solid State Electron., vol. 44, pp. 2045-2051, 2000.
-
(2000)
Solid State Electron
, vol.44
, pp. 2045-2051
-
-
Dimitriadis, C.A.1
Kimura, M.2
Miyasaka, M.3
Inoue, S.4
Farmakis, F.V.5
Brini, J.6
Kamarinos, G.7
-
4
-
-
0025417055
-
Mechanism of device degradation in n-channel and p-channel polysilicon TFTs by electrical stressing
-
Mar
-
I. W. Wu, W. B. Jackson, T. Y. Huang, A. G. Lewis, and A. Chiang, "Mechanism of device degradation in n-channel and p-channel polysilicon TFTs by electrical stressing," IEEE Electron Device Lett., vol. 11, no. 3, pp. 167-169, Mar. 1990.
-
(1990)
IEEE Electron Device Lett
, vol.11
, Issue.3
, pp. 167-169
-
-
Wu, I.W.1
Jackson, W.B.2
Huang, T.Y.3
Lewis, A.G.4
Chiang, A.5
-
5
-
-
0031208839
-
The anomalous behavior of hydrogenated/unhydrogenated polysilicon thin-film transistors under electric stress
-
May
-
K. Y. Lee, Y. K. Fang, C. W. Chen, K. C. Huang, M. S. Liang, and S. G. Wuu, "The anomalous behavior of hydrogenated/unhydrogenated polysilicon thin-film transistors under electric stress," IEEE Electron Device Lett., vol. 18, no. 5, pp. 382-384, May 1997.
-
(1997)
IEEE Electron Device Lett
, vol.18
, Issue.5
, pp. 382-384
-
-
Lee, K.Y.1
Fang, Y.K.2
Chen, C.W.3
Huang, K.C.4
Liang, M.S.5
Wuu, S.G.6
-
6
-
-
0032629884
-
Hot carrier effects in polycrystalline silicon thin-film transistors: Analysis of electrical characteristics and noise performance modifications
-
L. Mariucci, A. Pecora, S. Giovannini, R. Carluccio, F. Massussi, and G. Fortunato, "Hot carrier effects in polycrystalline silicon thin-film transistors: analysis of electrical characteristics and noise performance modifications," Microelectron. Reliab., vol. 39, pp. 45-52, 1999.
-
(1999)
Microelectron. Reliab
, vol.39
, pp. 45-52
-
-
Mariucci, L.1
Pecora, A.2
Giovannini, S.3
Carluccio, R.4
Massussi, F.5
Fortunato, G.6
-
7
-
-
0035249625
-
Anomalous turn-on voltage degradation during hot-carrier stress in polycrystalline silicon thin-film transistors
-
Feb
-
F. V. Farmakis, J. Brini, G. Kamarinos, and C. A. Dimitriadis, "Anomalous turn-on voltage degradation during hot-carrier stress in polycrystalline silicon thin-film transistors," IEEE Electron Device Lett., vol. 22, no. 2, pp. 74-76, Feb. 2001.
-
(2001)
IEEE Electron Device Lett
, vol.22
, Issue.2
, pp. 74-76
-
-
Farmakis, F.V.1
Brini, J.2
Kamarinos, G.3
Dimitriadis, C.A.4
-
8
-
-
0036610423
-
Electrical stressing effects in solid-phase crystallized polysilicon thin film transistors
-
D. N. Kouvatsos, V. E. Vamvakas, and D. Davazoglou, "Electrical stressing effects in solid-phase crystallized polysilicon thin film transistors," Semicond. Sci. Technol., vol. 17, p. 515, 2002.
-
(2002)
Semicond. Sci. Technol
, vol.17
, pp. 515
-
-
Kouvatsos, D.N.1
Vamvakas, V.E.2
Davazoglou, D.3
-
9
-
-
11344292818
-
Substrate current and degradation of n-channel polycrystalline silicon thin-film transistors
-
N. A. Hastas, N. Archontas, C. A. Dimitriadis, G. Kamarinos, T. Nikolaidis, N. Georgoulas, and A. Thanailakis, "Substrate current and degradation of n-channel polycrystalline silicon thin-film transistors," Microelectron. Reliab., vol. 45, pp. 341-348, 2005.
-
(2005)
Microelectron. Reliab
, vol.45
, pp. 341-348
-
-
Hastas, N.A.1
Archontas, N.2
Dimitriadis, C.A.3
Kamarinos, G.4
Nikolaidis, T.5
Georgoulas, N.6
Thanailakis, A.7
-
10
-
-
0001142560
-
Excimer laser annealing of amorphous and solid-phase-crystallized silicon films
-
M. Miyasaka and J. Stoemenos, "Excimer laser annealing of amorphous and solid-phase-crystallized silicon films," J. Appl. Phys., vol. 86, pp. 5556-5565, 1999.
-
(1999)
J. Appl. Phys
, vol.86
, pp. 5556-5565
-
-
Miyasaka, M.1
Stoemenos, J.2
-
11
-
-
0011782098
-
Threshold voltage of excimer-laser-annealed polycrystalline silicon thin-film transistors
-
C. T. Angelis, C. A. Dimitriadis, F. V. Farmakis, J. Brini, G. Kamarinos, and M. Miyasaka, "Threshold voltage of excimer-laser-annealed polycrystalline silicon thin-film transistors," Appl. Phys. Lett., vol. 76, pp. 2442-2444, 2000.
-
(2000)
Appl. Phys. Lett
, vol.76
, pp. 2442-2444
-
-
Angelis, C.T.1
Dimitriadis, C.A.2
Farmakis, F.V.3
Brini, J.4
Kamarinos, G.5
Miyasaka, M.6
-
12
-
-
23344433693
-
On-state drain current modeling of large-grain polycrystalline silicon thin-film transistors based on carrier transport through latitudinal and longitudinal grain boundaries
-
Aug
-
A. T. Hatzopoulos, D. H. Tassis, N. A. Hastas, C. A. Dimitriadis, and G. Kamarinos, "On-state drain current modeling of large-grain polycrystalline silicon thin-film transistors based on carrier transport through latitudinal and longitudinal grain boundaries," IEEE Trans. Electron Devices, vol. 52, no. 8, pp. 1727-1733, Aug. 2005.
-
(2005)
IEEE Trans. Electron Devices
, vol.52
, Issue.8
, pp. 1727-1733
-
-
Hatzopoulos, A.T.1
Tassis, D.H.2
Hastas, N.A.3
Dimitriadis, C.A.4
Kamarinos, G.5
-
13
-
-
0001265978
-
Two-dimensional simulation study of field-effect operation in undoped poly-Si thin-film transistors
-
H. S. Kong and C. Lee, "Two-dimensional simulation study of field-effect operation in undoped poly-Si thin-film transistors," J. Appl. Phys., vol. 78, pp. 6122-6131, 1995.
-
(1995)
J. Appl. Phys
, vol.78
, pp. 6122-6131
-
-
Kong, H.S.1
Lee, C.2
-
14
-
-
1442296225
-
An analytical moderate inversion drain current mode; for polycrystalline silicon thin-film transistors considering deep and tail states in the grain boundary
-
S. S. Chen and J. B. Kuo, "An analytical moderate inversion drain current mode; for polycrystalline silicon thin-film transistors considering deep and tail states in the grain boundary," J. Appl. Phys., vol. 79, pp. 1961-1967, 1996.
-
(1996)
J. Appl. Phys
, vol.79
, pp. 1961-1967
-
-
Chen, S.S.1
Kuo, J.B.2
-
15
-
-
0035390039
-
New procedure for the extraction of basic a-Si:H TFT model parameters in the linear and saturation regions
-
A. Cerdeira, M. Estrada, R. Garcia, A. Ortiz-Conde, and F. J. Garcia Sanchez, "New procedure for the extraction of basic a-Si:H TFT model parameters in the linear and saturation regions," Solid State Electron., vol. 45, pp. 1077-1080, 2001.
-
(2001)
Solid State Electron
, vol.45
, pp. 1077-1080
-
-
Cerdeira, A.1
Estrada, M.2
Garcia, R.3
Ortiz-Conde, A.4
Garcia Sanchez, F.J.5
-
16
-
-
0021427789
-
Physics of amorphous silicon based alloy field-effect transistors
-
M. Shur and M. Huck, "Physics of amorphous silicon based alloy field-effect transistors,"' J. Appl. Phys., vol. 55, pp. 3831-3842, 1984.
-
(1984)
J. Appl. Phys
, vol.55
, pp. 3831-3842
-
-
Shur, M.1
Huck, M.2
-
17
-
-
33947408316
-
The field effect mobility and the current-voltage characteristics of amorphous-silicon thin-film transistors
-
H. Miki, T. Tobita, T. Nakanishi, and K. Kariya, "The field effect mobility and the current-voltage characteristics of amorphous-silicon thin-film transistors," Jpn. J. Appl. Phys., vol. 30, pp. 2740-2741, 1991.
-
(1991)
Jpn. J. Appl. Phys
, vol.30
, pp. 2740-2741
-
-
Miki, H.1
Tobita, T.2
Nakanishi, T.3
Kariya, K.4
|