Smooth surface dry etching of diamond by very high frequency inductively coupled plasma

New Diamond and Frontier Carbon Technology

Volumn 16, Issue 2, 2006, Pages 97-106

  Yoshikawa, Hiromichi ^a,b   Shikata, Shinichi ^b   Fujimori, Naoji ^b   Sato, Naoyuki ^a   Ikehata, Takashi ^a  

^a IBARAKI UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Diamond; Etching; ICP; RIE; VHF

Indexed keywords

ELECTRIC EXCITATION; FLUXES; INDUCTIVELY COUPLED PLASMA; MAGNETIC FIELDS; MORPHOLOGY; OXYGEN; REACTIVE ION ETCHING; SPECTROSCOPIC ANALYSIS; SUBSTRATES;

HIGH-IONIC-OXYGEN-ATOM FLUX; OPTICAL EMISSION SPECTROSCOPY (OES); QUADRUPOLE MASS SPECTROSCOPY (QMS); VERY HIGH FREQUENCY (VHF);

DIAMONDS;

EID: 33745626490     PISSN: 13449931     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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