Microlens formation using heavily dyed photoresist in a single step

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

  Cox, Chris ^a   Planje, Curtis ^a   Brakensiek, Nick ^a   Zhu, Zhimin ^a   Mayo, Jonathan ^a  

^a BREWER SCIENCE INC   (United States)

Author keywords

Array; Dye; Microlens; Photoresist; Reflow

Indexed keywords

ABSORPTION; ARRAYS; COMPUTER SIMULATION; COST EFFECTIVENESS; DYES; PHOTORESISTS;

ABSORBING DYES; MICROLENS FORMATION; REFLOW;

MICROLENSES;

EID: 33745625895     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.654531     Document Type: Conference Paper

References (3)

1. US Patent 6,646,808, Microlens formed of negative resist, Li; Zong-fu, Intel Corp., USA.
2. US Patenet 6,507,439, Microlens formation through focal plane control of aerial image, Wester; Neil, Intel Corp., USA.
3. US Patent 5,324,623, Microlens forming method, Tsumori; Toshiro, Sony Corporations, Tokyo, Japan.