LWR reduction in ArF resist pattern by resist smoothing process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

  Inatomi, Yuichiro ^a   Kawasaki, Tetsu ^a   Iwashita, Mitsuaki ^a  

^a TOKYO ELECTRON LTD   (Japan)

Author keywords

ArF resist; LWR; Roughness

Indexed keywords

ETCHING; LIGHT SOURCES; LITHOGRAPHY; OPTICAL PROPERTIES; SOLUBILITY; SURFACE ROUGHNESS;

ARF RESIST; LINE-WIDTH ROUGHNESS (LWR); LWR;

SEMICONDUCTOR MATERIALS;

EID: 33745620488     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656382     Document Type: Conference Paper

References (0)