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Volumn 18, Issue 10, 2006, Pages 2489-2498

1,1,1,5,5,5-hexafluoroacetylacetonate copper(I) poly(vinylsiloxane)s as precursors for copper direct-write

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DATA REDUCTION; METALLIC FILMS; MONOMERS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICONES;

EID: 33745616541     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm052103s     Document Type: Article
Times cited : (12)

References (44)
  • 24
    • 33745607417 scopus 로고    scopus 로고
    • Material and method for printing high conductivity electrical conductors and other components on thin film transistor arrays. U.S. Patent 6,274,412
    • Kydd, P. H.; Wagner, S.; Gleskova, H. Material and method for printing high conductivity electrical conductors and other components on thin film transistor arrays. U.S. Patent 6,274,412, 1999.
    • (1999)
    • Kydd, P.H.1    Wagner, S.2    Gleskova, H.3
  • 25
    • 33745629916 scopus 로고    scopus 로고
    • Low-temperature method and compositions for producing electrical conductors. WO 03/003381
    • Kydd, P. H.; Jablonski, G. A.; Richard, D. L. Low-temperature method and compositions for producing electrical conductors. WO 03/003381, 2001.
    • (2001)
    • Kydd, P.H.1    Jablonski, G.A.2    Richard, D.L.3
  • 26
    • 33745627586 scopus 로고    scopus 로고
    • Preparations containing fine-particulate inorganic oxides. WO 00/20519
    • Gonzalez-Blanco, J.; Hoheisel, W.; Sicking, J. Preparations containing fine-particulate inorganic oxides. WO 00/20519, 2000.
    • (2000)
    • Gonzalez-Blanco, J.1    Hoheisel, W.2    Sicking, J.3
  • 32
    • 33745612822 scopus 로고    scopus 로고
    • Method for preparation of diphenylsiloxane-dimethylsiloxane copolymers. EP 0 693 521 A1
    • Okawa, T. Method for preparation of diphenylsiloxane-dimethylsiloxane copolymers. EP 0 693 521 A1, 1996.
    • (1996)
    • Okawa, T.1
  • 41
    • 33745622953 scopus 로고    scopus 로고
    • Solutions of precursor copper compounds for copper film deposition by chemical vapor deposition and their preparation. Euro. Pat. 989,133
    • Shin, H.-K.: Suwon, K.-D. Solutions of precursor copper compounds for copper film deposition by chemical vapor deposition and their preparation. Euro. Pat. 989,133, 2000; p 17 pp.
    • (2000)
    • Shin, H.-K.1    Suwon, K.-D.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.