Electron beam lithography on LiF films for integrated active optical waveguides

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3423, Issue , 1998, Pages 83-87

  Baldacchini, G ^a   Burattini, E ^b   Grilli, A ^b   Raco, A ^b   Mancini, A ^a   Montereali, R M ^a   Pace, A ^a  

^a ENEA   (Italy)

^b INFN LABORATORI NAZIONALI DI FRASCATI   (Italy)

Author keywords

E beam writing; Lattice defects; LiF; Waveguides

Indexed keywords

CRYSTAL DEFECTS; DEFECTS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRONS; LASER APPLICATIONS; LITHIUM COMPOUNDS; REFRACTIVE INDEX; SINGLE CRYSTALS; WAVEGUIDES;

ACTIVE CHANNEL WAVEGUIDES; ACTIVE DEFECTS; E-BEAMS; LIF SINGLE CRYSTALS; LOW ENERGY ELECTRON BEAM IRRADIATION; POLYCRYSTALLINE FILM; REAL PART; VISIBLE SPECTRAL RANGE;

OPTICAL WAVEGUIDES;

EID: 33745614535     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.316557     Document Type: Conference Paper

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