A comparative study on the performance of a xenon capillary Z-pinch EUV lithography light source using a pinhole camera

Plasma Sources Science and Technology

Volumn 15, Issue 3, 2006, Pages 322-327

  Song, Inho ^a   Iwata, Kazuhiro ^a   Homma, Yusuke ^a   Mohanty, Smruti R ^b   Watanabe, Masato ^a   Kawamura, Toru ^a   Okino, Akitoshi ^a   Yasuoka, Koichi ^a   Horioka, Kazuhiko ^a   Hotta, Eiki ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b Centre of Plasma Physics   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION; XENON;

DISCHARGE CURRENTS; EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; GAS PRESSURE; PINHOLE CAMERAS;

LIGHT SOURCES;

EID: 33745606239     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/3/004     Document Type: Article

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