Processing of acrylate-based 193-nm resists: Influence of physico-chemical properties

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 176-187

  Mortini, Benedicte P ^a   Rosilio, Charles ^b   Prola, Alain ^c   Paniez, Patrick J ^c  

^a STMICROELECTRONICS   (Italy)

^b DIF   (France)

^c ORANGE LABS   (France)

Author keywords

193 nm lithography; Acrylate polymers; Chemical properties; Physical properties; THP group

Indexed keywords

CHEMICAL PROPERTIES; PHYSICAL PROPERTIES;

193 NM LITHOGRAPHY; 193-NM RESISTS; ACRYLATE POLYMERS; NEW MATERIALS; PHYSICAL AND CHEMICAL PROPERTIES; PHYSICO-CHEMICAL PROPERTIES; PROTECTING GROUPS; THP GROUP;

GROUP TECHNOLOGY;

EID: 33745583869     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312406     Document Type: Conference Paper

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