X-ray photoemission spectroscopy characterization of electrochemical growth of conducting polymer on oxidized Si surface

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 4, 2006, Pages 1505-1508

  Kato, H ^a   Takemura, S ^a   Takakuwa, N ^a   Ninomiya, K ^a   Watanabe, T ^a   Watanabe, Y ^a   Nanba, N ^a   Hiramatsu, T ^a  

^a KANTO GAKUIN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SCANNING TUNNELING MICROSCOPY; SILICON; SPECTROSCOPIC ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTROCHEMICAL GROWTH; POLYMER DEPOSITION SHRANK; POLYMER GROWTH; POLYTHIOPHENE; REFLECTION ABSORPTION SPECTROSCOPY; X-RAY PHOTOEMISSION SPECTROSCOPY (XPS);

ORGANIC POLYMERS;

EID: 33745504222     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2208995     Document Type: Article

References (19)

1. Y.-Y. Lin, D. J. Grundlach, S. Nelson, and T. N. Jackson, IEEE Electron Device Lett. 18, 606 (1997).
2. T. N. Jackson, Proceedings of the 2001 International Semiconductor Device Research Symposium, Washington DC, 2001 (unpublished), p. 340.
3. T. A. Chen, X. Wu, and R. D. Rieke, J. Am. Chem. Soc. 117, 233 (1995).
4. G. Horowitz, J. Mater. Chem. 9, 2021 (1999).
5. G. Holowitz and M. G. Hajlaoui, Synth. Met. 122, 185 (2001).
6. S. F. Nelson, Y.-Y. Lin, D. J. Grundlach, and T. N. Jackson, Appl. Phys. Lett. 72, 1854 (1998).
7. C. W. Tang, S. A. VanSlyke, and C. H. Chen, J. Appl. Phys. 65, 3610 (1989).
8. M. A. Baldo, S. Lamansky, P. E. Barrows, M. E. Thompson, and S. R. Forrest, Appl. Phys. Lett. 75, 4 (1998).
9. J. Bargon, S. Mohaman, and K. J. Waltman, IBM J. Res. Dev. 27, 130 (1983).
10. A. Hiraki, E. Lugujjo, and J. W. Mayor, J. Appl. Phys. 43, 3643 (1972).
11. T. Suzuki, M. Muto, M. Hara, T. Hattori, K. Yamade, and H. Yamauchi, Extended Abstracts of the 16th International Conference on Solid State Devices and Materials, Kobe, 1984 (unpublished), p. 297.
12. T. Hattori and T. Suzuki, Appl. Phys. Lett. 43, 470 (1983).
13. T. Asano and H. Ishiwara, J. Appl. Phys. 55, 3566 (1984).
14. R. Ludeke and K. Koma, Phys. Rev. Lett. 34, 1170 (1975).
15. A. Koma and R. Ludeke, Phys. Rev. Lett. 35, 107 (1975).
16. H. Kato, S. Takemura, and Y. Nakajima, Proceedings of Ninth Cimtec-World Forum on New Materials, Surface and Near-Surface Analysis of Materials, Florence, 1999 (unpublished), Vol. 9, p. 123.
17. G. Hollinger and F. J. Himpsel, Appl. Phys. Lett. 44, 93 (1983).
18. R. Shalvoy, G. B. Fisher, and P. J. Stiles, Phys. Rev. B 15, 1680 (1977).
19. G. Hollinger, P. Kumurdijian, J. M. Mackowski, P. Pertosa, L. Porte, and T. M. Duc, J. Electron Spectrosc. Relat. Phenom. 5, 237 (1974).