Para-sexiphenyl thin films grown by hot wall epitaxy on KCl(001) substrates

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 4, 2006, Pages 1660-1663

  Andreev, A Yu ^a,b   Montaigne, A ^b   Hlawacek, G ^a   Sitter, H ^b   Teichert, C ^a  

^a UNIVERSITY OF LEOBEN   (Austria)

^b JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; DEPOSITION; FILM GROWTH; MOLECULES; MORPHOLOGY; NUCLEATION; POTASSIUM COMPOUNDS; SUBSTRATES; WETTING;

CRYSTALLITES; HOT WALL EPITAXY; PARA-SEXIPHENYL; SYMMETRY;

THIN FILMS;

EID: 33745497550     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2172933     Document Type: Article

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