Reactive vacuum vapor deposition of aluminum oxide thin films by an air-to-air metallizer

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 4, 2006, Pages 939-945

  Kobayashi, T ^a   Itoh, Y ^b,c   Nakano, Y ^a   Hirai, E ^a   Hashimoto, R ^a   Kamikawa, S ^d  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

^b 888 1 Emmyoucho Kashiwara city   (Japan)

^c KURUME NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^d HITACHI CABLE LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; EVAPORATION; MAGNETIC FLUX; MONTE CARLO METHODS; PLASTIC FILMS; VAPOR DEPOSITION;

ALUMINUM OXIDES; METALLIZERS; SUBSTOICHIOMETRIC OXIDE; VACUUM VAPOR DEPOSITION;

THIN FILMS;

EID: 33745486387     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2198871     Document Type: Article

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