Measurement and analysis of water adsorption in porous silica films

Journal of the Electrochemical Society

Volumn 153, Issue 8, 2006, Pages

  Kuroki, Shin Ichiro ^a,c   Kikkawa, Takamaro ^a,b  

^a HIROSHIMA UNIVERSITY   (Japan)

^b ELECTROCHEMICAL SOCIETY

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; DIELECTRIC PROPERTIES; ELECTROCHEMISTRY; GAS ADSORPTION; PERMITTIVITY; POROUS SILICON; THIN FILMS;

CAPACITANCE VALUE; HEXAMETHYLDISILAZANE (HMDS); POROUS SILICA FILMS; VAPOR TREATMENT;

WATER ABSORPTION;

EID: 33745486195     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2210573     Document Type: Article

References (9)

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