High-temperature thermal decomposition of benzyl radicals

Journal of Physical Chemistry A

Volumn 110, Issue 21, 2006, Pages 6649-6653

  Oehlschlaeger, Matthew A ^a,c   Davidson, David F ^a,b   Hanson, Ronald K ^a  

^a Stanford University   (United States)

^b STANFORD UNIVERSITY   (United States)

^c RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BENZYL RADICAL; RATE COEFFICIENT; TEMPERATURE DEPENDENCE; ULTRAVIOLET LASER ABSORPTION;

ARGON; LIGHT ABSORPTION; PRESSURE EFFECTS; PYROLYSIS; ULTRAVIOLET RADIATION;

ORGANIC COMPOUNDS;

EID: 33745473749     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp055396l     Document Type: Article

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