Photobleaching comparison of poly(methylphenylsilylene) and poly(phenylsilyne)

Journal of Applied Physics

Volumn 96, Issue 11, 2004, Pages 6313-6318

  Thomes Jr , William J ^a   Simmons Potter, Kelly ^b   Phifer, Carol C ^a   Potter Jr , Barrett G ^b   Jamison, Gregory M ^a   Jones, Jess E ^c   Casadonte Jr , Dominick J ^c  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b UNIVERSITY OF ARIZONA   (United States)

^c TEXAS TECH UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FRAMEWORKS; PHENYL RINGS; SI-BASED POLYMERS; STRIP WAVEGUIDES;

ABSORPTION; CROSSLINKING; ELECTRONIC STRUCTURE; PHENOLS; PHOTOCATALYSIS; PHOTODEGRADATION; PHOTOSENSITIVITY; REFRACTIVE INDEX; SILICON; THIN FILMS;

POLYSILANES;

EID: 33745408857     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1808908     Document Type: Article

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