The wulff shape of alumina: IV. Ti 4+-doped alumina

Journal of the American Ceramic Society

Volumn 88, Issue 12, 2005, Pages 3492-3500

  Kitayama, Mikito ^a,b,c   Glaeser, Andreas M ^a,b  

^a Lawrence Berkeley National Laboratory   (United States)

^b AMERICAN CERAMIC SOCIETY   (United States)

^c FUKUOKA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROLLED-GEOMETRY CAVITIES; SURFACE ENERGY SEQUENCE; TI 4+-DOPED ALUMINA;

ANNEALING; DIFFUSION; INTERFACIAL ENERGY; PHOTOLITHOGRAPHY; SEMICONDUCTOR DOPING; TITANIUM COMPOUNDS;

ALUMINA;

EID: 33745306881     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2005.00604.x     Document Type: Article

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