Immersion's evolution launches the age of hyper-NA lithography

Solid State Technology

Volumn 49, Issue 5, 2006, Pages 32-34

  Wagner, Christian ^a   Kool, Ron ^a   Modderman, Theo ^a   Jasper, Hans ^a   Ronse, Kurt ^b,c,d  

^a ASML   (Netherlands)

^b IMEC   (Belgium)

^c UNIVERSITY OF LEUVEN   (Belgium)

^d CMOS Device Research Group   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECT FORMATION PROCESSES; IMMERSION LITHOGRAPHY; IMMERSION TECHNOLOGY; VOLUME MANUFACTURING;

INTEGRATED CIRCUIT MANUFACTURE; OPTIMIZATION; PROCESS CONTROL; RESEARCH AND DEVELOPMENT MANAGEMENT;

LITHOGRAPHY;

EID: 33745288201     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Review

References (2)

1. B.Streefkerk, et al., Extending Optical Lithography with Immersion, SPIE Vol. 5377, pages 285-304, 2004
2. "TSMC; Immersion Litho Nearly Production Ready," Electronic News, 2/22/2006