|
Volumn 419, Issue 1-2, 2006, Pages 262-266
|
The behavior of tungsten oxides in the presence of copper during hydrogen reduction
|
Author keywords
Chemical vapor transport; Hydrogen reduction; Tungsten oxide; W Cu composite
|
Indexed keywords
ATMOSPHERIC HUMIDITY;
CHEMICAL VAPOR DEPOSITION;
COPPER;
ELECTRIC RESISTANCE;
HYDROGEN;
OXIDES;
REACTION KINETICS;
CHEMICAL VAPOR TRANSPORT;
FOUR-POINT PROBE METHOD;
HYDROGEN REDUCTION;
W-CU COMPOSITE;
TUNGSTEN COMPOUNDS;
|
EID: 33745258662
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2005.09.061 Document Type: Article |
Times cited : (26)
|
References (12)
|