Trends in total reflection X-ray fluorescence spectrometry for metallic contamination control in semiconductor nanotechnology

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 61, Issue 5, 2006, Pages 496-514

  Hellin, David ^a,b   De Gendt, Stefan ^a,b   Valckx, Nick ^b   Mertens, Paul W ^a   Vinckier, Chris ^b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Multi element detection; Preconcentration technique; Quantification and calibration procedure; Total reflection X ray fluorescence (TXRF); Wafer mapping

Indexed keywords

CONTAMINATION; FLUORESCENCE; LIGHT REFLECTION; SEMICONDUCTOR MATERIALS; SILICON WAFERS; X RAY ANALYSIS;

MULTI-ELEMENT DETECTION; PRECONCENTRATION TECHNIQUE; QUANTIFICATION AND CALIBRATION PROCEDURE; TOTAL REFLECTION X-RAY FLUORESCENCE (TXRF); WAFER MAPPING;

NANOTECHNOLOGY;

EID: 33745205833     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sab.2006.03.008     Document Type: Review

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