HfO 2/metal stacks: Determination of energy level diagram, work functions & their dependence on metal deposition

Digest of Technical Papers - Symposium on VLSI Technology

Volumn 2005, Issue , 2005, Pages 44-45

  Zafar, S ^a   Narayanan, V ^a   Callegari, A ^a   McFeely, F R ^a   Jamison, P ^a   Gusev, E ^a   Cabrai Jr , C ^a   Jammy, R ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY LEVEL BAND DIAGRAM; FERMI PINNING EFFECT; WORK FUNCTIONS;

CARRIER CONCENTRATION; DEPOSITION; ELECTRON ENERGY LEVELS; SILICA; SPUTTER DEPOSITION;

HAFNIUM COMPOUNDS;

EID: 33745155070     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/.2005.1469205     Document Type: Conference Paper

References (3)

1. J. K. Schaeffer et al, IEDM 2004;
2. [2]: S. Zafar et al, AP, 4858 (2002);
3. R. Williams, Phys. Rev. A. 140, 569 (1965).