-
2
-
-
0036849708
-
Athermal low-loss echelle-grating-based multimode dense wavelength division demultiplexer
-
J. Qiao, F. Zhao, R. T. Chen, J. W. Horwitz, and W. W. Morey, "Athermal low-loss echelle-grating-based multimode dense wavelength division demultiplexer," Appl. Opt. 41, 6567-6574 (2002).
-
(2002)
Appl. Opt.
, vol.41
, pp. 6567-6574
-
-
Qiao, J.1
Zhao, F.2
Chen, R.T.3
Horwitz, J.W.4
Morey, W.W.5
-
3
-
-
0036575525
-
Not all multiplexing technologies are on the same wavelength
-
A. Sappey, "Not all multiplexing technologies are on the same wavelength," Photonics Spectra 36, 78-84 (2002).
-
(2002)
Photonics Spectra
, vol.36
, pp. 78-84
-
-
Sappey, A.1
-
5
-
-
84975560921
-
All-dielectric high-efficiency reflection gratings made with multilayer thin-film coatings
-
L. Li and J. Hirsh, "All-dielectric high-efficiency reflection gratings made with multilayer thin-film coatings," Opt. Lett. 20, 1349-1351 (1995).
-
(1995)
Opt. Lett.
, vol.20
, pp. 1349-1351
-
-
Li, L.1
Hirsh, J.2
-
6
-
-
0001080721
-
High-efficiency fused-silica transmission gratings
-
H. T. Nguyen, B. W. Shore, S. J. Bryan, J. A. Britten, R. D. Boyd, and M. D. Perry, "High-efficiency fused-silica transmission gratings," Opt. Lett. 22, 142-144 (1997).
-
(1997)
Opt. Lett.
, vol.22
, pp. 142-144
-
-
Nguyen, H.T.1
Shore, B.W.2
Bryan, S.J.3
Britten, J.A.4
Boyd, R.D.5
Perry, M.D.6
-
7
-
-
20544435738
-
Design, optical characterization, and operation of large transmission gratings for the laser integration line and laser megajoule facilities
-
J. Néauport, E. Journot, G. Gaborit, and P. Bouchut, "Design, optical characterization, and operation of large transmission gratings for the laser integration line and laser megajoule facilities" Appl. Opt. 44, 3143-3152 (2005).
-
(2005)
Appl. Opt.
, vol.44
, pp. 3143-3152
-
-
Néauport, J.1
Journot, E.2
Gaborit, G.3
Bouchut, P.4
-
8
-
-
0344254746
-
Highly efficient transmission gratings in fused silica for chirped-pulse amplification systems
-
T. Clausnitzer, J. Limpert, K. Zöllner, H. Zellmer, H. J. Fuchs, E. B. Kley, A. Tünnermann, M. Jup, and D. Ristau, "Highly efficient transmission gratings in fused silica for chirped-pulse amplification systems," Appl. Opt. 42, 6934-6938 (2003).
-
(2003)
Appl. Opt.
, vol.42
, pp. 6934-6938
-
-
Clausnitzer, T.1
Limpert, J.2
Zöllner, K.3
Zellmer, H.4
Fuchs, H.J.5
Kley, E.B.6
Tünnermann, A.7
Jup, M.8
Ristau, D.9
-
9
-
-
0029307028
-
Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings
-
M. G. Moharam, E. B. Grann, D. A. Pommet, and T. K. Gaylord, "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," J. Opt. Soc. Am. A 12, 1068-1076 (1995).
-
(1995)
J. Opt. Soc. Am. A
, vol.12
, pp. 1068-1076
-
-
Moharam, M.G.1
Grann, E.B.2
Pommet, D.A.3
Gaylord, T.K.4
-
10
-
-
13644268958
-
High-efficiency reflective diffraction gratings in fused silica as (de)multiplexers at 1.55 mm for dense wavelength division multiplexing application
-
Y. Zhang and C. Zhou, "High-efficiency reflective diffraction gratings in fused silica as (de)multiplexers at 1.55 mm for dense wavelength division multiplexing application," J. Opt. Soc. Am. A 22, 331-334 (2005).
-
(2005)
J. Opt. Soc. Am. A
, vol.22
, pp. 331-334
-
-
Zhang, Y.1
Zhou, C.2
-
11
-
-
84975563833
-
Numerical study of Dammann array illuminator
-
C. Zhou and L. Liu, "Numerical study of Dammann array illuminator," Appl. Opt. 34, 5961-5969 (1995).
-
(1995)
Appl. Opt.
, vol.34
, pp. 5961-5969
-
-
Zhou, C.1
Liu, L.2
-
12
-
-
0000384320
-
Diffractive lens fabricated with binary features less than 60 nm
-
J. N. Mait, A. Scherer, O. Dial, D. W. Prather, and X. Gao, "Diffractive lens fabricated with binary features less than 60 nm," Opt. Lett. 25, 381-383 (2000).
-
(2000)
Opt. Lett.
, vol.25
, pp. 381-383
-
-
Mait, J.N.1
Scherer, A.2
Dial, O.3
Prather, D.W.4
Gao, X.5
-
13
-
-
0001526581
-
2 and Si in fluorocarbon plasma: A detailed surface model accounting for etching and deposition
-
2 and Si in fluorocarbon plasma: A detailed surface model accounting for etching and deposition," J. Appl. Phys. 88, 5570-5584 (2000).
-
(2000)
J. Appl. Phys.
, vol.88
, pp. 5570-5584
-
-
Gogolides, E.1
Vauvert, P.2
-
14
-
-
23344432886
-
Optimized condition for etching fused-silica phase gratings with inductively coupled plasma technology
-
S. Wang and C. Zhou, "Optimized condition for etching fused-silica phase gratings with inductively coupled plasma technology," Appl. Opt. 44, 4429-4434 (2005).
-
(2005)
Appl. Opt.
, vol.44
, pp. 4429-4434
-
-
Wang, S.1
Zhou, C.2
|