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Volumn 49, Issue 4, 2006, Pages 802-808

Pyrolytic removal of the plastic mandrel from sputtered beryllium shells

Author keywords

[No Author keywords available]

Indexed keywords

BERYLLIUM; LASER APPLICATIONS; PRESSURE EFFECTS; PYROLYSIS; REMOVAL; SPUTTER DEPOSITION;

EID: 33745024304     PISSN: 15361055     EISSN: None     Source Type: Journal    
DOI: 10.13182/FST06-A1204     Document Type: Conference Paper
Times cited : (9)

References (13)
  • 1
    • 12844256957 scopus 로고    scopus 로고
    • The national ignition facility
    • G. H. MILLER, E. I. MOSES, AND C. R. WUEST, "The National Ignition Facility," Opt. Eng. 43, 2841 (2004).
    • (2004) Opt. Eng. , vol.43 , pp. 2841
    • Miller, G.H.1    Moses, E.I.2    Wuest, C.R.3
  • 2
    • 12144287281 scopus 로고    scopus 로고
    • Update on NIF indirect drive ignition target fabrication specifications
    • S. W. HAAN, et al., "Update on NIF Indirect Drive Ignition Target Fabrication Specifications," Fusion Sci. Technol. 45, 69 (2004).
    • (2004) Fusion Sci. Technol. , vol.45 , pp. 69
    • Haan, S.W.1
  • 7
    • 0003428285 scopus 로고
    • edited by D. E. GRAY, McGraw-Hill, New York
    • -1
    • (1973) rd ed , pp. 4-121
  • 10
    • 0001456713 scopus 로고    scopus 로고
    • The PαMS/GDP process for production of ICF target mandrels
    • B. W. McQUILLAN, et al., "The PαMS/GDP Process for Production of ICF Target Mandrels," Fusion Technol. 31, 381 (1997).
    • (1997) Fusion Technol. , vol.31 , pp. 381
    • McQuillan, B.W.1
  • 12
    • 0003998388 scopus 로고    scopus 로고
    • edited by DAVID R. LIDE, CRC Press, New York
    • 2 was used to check that this kind relatively low temperature fit can be reasonably used at temperatures up to 600°C.
    • (1997) Handbook of Chemistry and Physics, 78th Ed , pp. 6-14
  • 13
    • 0039200995 scopus 로고
    • The kinetics of the reaction of beryllium with oxygen and nitrogen and the effect of oxide and nitride films on its vapor pressure
    • E. A. GULBRANSEN and K. F. ANDREW, "The Kinetics of the Reaction of Beryllium with Oxygen and Nitrogen and the Effect of Oxide and Nitride Films on its Vapor Pressure," J. Electrochem. Soc. 97, 383 (1950).
    • (1950) J. Electrochem. Soc. , vol.97 , pp. 383
    • Gulbransen, E.A.1    Andrew, K.F.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.