Corrigendum to "Synthesis of the CoOOH fine nanoflake film with the high rate capacitance property" [J. Power Sources 158 (2006) 779-783] (DOI:10.1016/j.jpowsour.2005.09.052);Synthesis of the CoOOH fine nanoflake film with the high rate capacitance property

Journal of Power Sources

Volumn 158, Issue 1, 2006, Pages 779-783

  Hosono, Eiji ^a   Fujihara, Shinobu ^b   Honma, Iraru ^a   Ichihara, Masaki ^c   Zhou, Haoshen ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b KEIO UNIVERSITY   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

Author keywords

Chemical bath deposition; CoOOH; Electrochemical capacitor; High rate property

Indexed keywords

CAPACITANCE; COBALT COMPOUNDS; ELECTROCHEMISTRY; NANOSTRUCTURED MATERIALS; OXIDATION; REACTION KINETICS; SYNTHESIS (CHEMICAL);

CHEMICAL BATH DEPOSITION; ELECTROCHEMICAL CAPACITORS; HIGH RATE PROPERTY; NANOFLAKE FILMS;

THIN FILMS;

EID: 33744992688     PISSN: 03787753     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpowsour.2006.06.059     Document Type: Erratum

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