In-situ measurement of molecular orientation of the pentacene ultrathin films grown on SiO2 substrates

Surface Science

Volumn 600, Issue 12, 2006, Pages 2518-2522

  Yoshikawa, Genki ^a   Miyadera, Tetsuhiko ^a   Onoki, Ryo ^b   Ueno, Keiji ^b   Nakai, Ikuyo ^a   Entani, Shiro ^a   Ikeda, Susumu ^a   Guo, Dong ^a   Kiguchi, Manabu ^c   Kondoh, Hiroshi ^a   Ohta, Toshiaki ^a   Saiki, Koichiro ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b SAITAMA UNIVERSITY   (Japan)

^c HOKKAIDO UNIVERSITY   (Japan)

Author keywords

Aromatics; Atomic force microscopy; In situ characterization; Near edge extended X ray absorption fine structure (NEXAFS); Pentacene; Silicon oxides; Surface structure, morphology, roughness and topography; Thin film structures

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; MOLECULAR ORIENTATION; OLEFINS; SUBSTRATES; THIN FILMS;

AROMATICS; IN-SITU CHARACTERIZATION; NEAR EDGE EXTENDED X-RAY ABSORPTION FINE STRUCTURE (NEXAFS); PENTACENE; SILICON OXIDES; SURFACE STRUCTURE, MORPHOLOGY, ROUGHNESS AND TOPOGRAPHY; THIN FILM STRUCTURES;

SILICA;

EID: 33744992043     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.04.012     Document Type: Article

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