A microwave plasma model for a PCVD setup

Journal of Physics D: Applied Physics

Volumn 39, Issue 12, 2006, Pages 2553-2564

  Van Den Donker, Michiel ^a   Van Dijk, Jan ^a   Van Stralen, Mathé ^b   Broks, Bart ^a   De Vries, Nienke ^a   Janssen, Ger ^c   Van Der Mullen, Joost ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b Draka Comteq   (Netherlands)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; CHEMICAL VAPOR DEPOSITION; ELECTROMAGNETIC WAVES; IONIZATION; OPTICAL GLASS; PRESSURE MEASUREMENT;

ARGON PLASMA; IONIZATION DEGREE; THERMODYNAMIC EQUILIBRIUM; VELOCITY FIELD;

PLASMAS;

EID: 33744957422     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/39/12/013     Document Type: Article

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