Investigation of oxide layer structure on niobium surface using a secondary ion mass spectrometry

Physica C: Superconductivity and its Applications

Volumn 441, Issue 1-2, 2006, Pages 79-82

  Wu, A T ^a  

^a THOMAS JEFFERSON NATIONAL ACCELERATOR FACILITY   (United States)

Author keywords

Niobium; Oxide layer structure; SIMS; Superconducting RF cavities; Surface; Surface depth profile

Indexed keywords

CHEMICAL POLISHING; CRACK INITIATION; ELECTROLYTIC POLISHING; IN SITU PROCESSING; IONS; SECONDARY ION MASS SPECTROMETRY; SURFACE TESTING; X RAY PHOTOELECTRON SPECTROSCOPY;

BUFFERED ELECTROPOLISHING; OXIDE LAYER STRUCTURES; SUPERCONDUCTING RF CAVITIES; SURFACE DEPTH PROFILE;

NIOBIUM;

EID: 33744931383     PISSN: 09214534     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physc.2006.03.125     Document Type: Article

References (6)

1. A. Chincarini et al., in: Proceedings of the 10th workshop on RF superconductivity (2001) 382.
2. A.T. Wu et al., "Highly Smooth Nb Surfaces Fabricated by Buffered Electropolishing" (2006), submitted for publication.
3. J.R. Delayen et al., in: Proceedings of the 10th workshop on RF superconductivity (2001) 499.
4. A.T. Wu, in: Proceedings of the 11th workshop on RF superconductivity (2003) ThP13.
5. Benninghoven A. CRC Crit. Rev. Solid State Sci. 6 (1976) 291
6. Plog C., et al. Surf. Sci. 67 (1977) 565