Sub- 10-nm high aspect ratio patterning of ZnO in a 500 μm main field

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 3, 2006, Pages 1215-1218

  Saifullah, M S M ^a   Subramanian, K R V ^a   Anderson, D ^b   Kang, Dae Joon ^c   Huck, W T S ^a   Jones, G A C ^b   Welland, M E ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CRYSTALLINE MATERIALS; ELECTRON BEAMS; FABRICATION; SURFACE ROUGHNESS; TOLUENE;

ASPECT RATIO PATTERNING; NANOFABRICATION; ZINC NAPHTHENATE;

ZINC OXIDE;

EID: 33744779917     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2192545     Document Type: Article

References (12)

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