Non-contact charge-voltage method for dielectric characterization on small test areas of IC product wafers

Materials Science in Semiconductor Processing

Volumn 9, Issue 1-3, 2006, Pages 252-256

  Edelman, Piotr ^a   Marinskiy, Dmitriy ^a   Almeida, Carlos ^a   Kochey, Joseph N ^a   Byelyayev, Anton ^a   Wilson, Marshall ^a   Savtchouk, Alexandre ^a   D'Amico, John ^a   Findlay, Andrew ^a   Jastrzebski, Lubek ^a   Lagowski, Jacek ^a  

^a Semiconductor Diagnostics Inc   (United States)

Author keywords

Advanced dielectrics; Corona discharge; CV; Kelvin force; Non contact; Scribe line testing

Indexed keywords

CAPACITANCE; COMPUTER VISION; DIELECTRIC MATERIALS; ELECTRIC POTENTIAL; IMPURITIES; LEAKAGE CURRENTS; SEMICONDUCTOR DEVICE MANUFACTURE;

ADVANCED DIELECTRICS; CORONA DISCHARGE; CV; KELVIN FORCE; NON-CONTACT CHARGE-VOLTAGE METHOD; SCRIBE LINE TESTING;

INTEGRATED CIRCUIT LAYOUT;

EID: 33744543900     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2006.01.042     Document Type: Article

References (9)

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