Synthesis of mesoporous aluminosilicates with low Si/Al ratios using a single-source molecular precursor under acidic conditions

Journal of Porous Materials

Volumn 13, Issue 3, 2006, Pages 187-193

  Li, Ying ^a   Yang, Qihua ^a   Yang, Jie ^a   Li, Can ^a  

^a DALIAN INSTITUTE OF CHEMICAL PHYSICS   (China)

Author keywords

Acidity; Bis(sec butoxy)aluminoxy triethoxysilane; Mesoporous Aluminosilicates; Si Al ratio

Indexed keywords

ACIDITY; ADSORPTION; INFRARED SPECTROSCOPY; MESOPOROUS MATERIALS; STOICHIOMETRY; SYNTHESIS (CHEMICAL);

BIS(SEC-BUTOXY)ALUMINOXY-TRIETHOXYSILANE; MESOPOROUS ALUMINOSILICATES; SI/AL RATIO;

ALUMINUM COMPOUNDS;

EID: 33744538356     PISSN: 13802224     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10934-006-8003-8     Document Type: Article

References (24)

1. J.S. Kresge, M.E. Leonowicz, W.J. Roth, J.C. Vartuli, and J.S. Beck, Nature (London) 359, 710 (1992);
2. (b) J.S. Beck, J.C. Vartuli, W.J. Roth, M.E. Leonowicz, C.T. Kresge, K.D. Schmitt, C.T.W. Chu, D.H. Olson, E.W. Sheppard, S.C. Cullen, J.B. Higgins, and J.L. Schlenker, J. Am. Chem. Soc. 114, 10834 (1992).
3. Corma, M.S. Grand, and A.V. Gonzalez, A.V. Orichilles, J.Catal. 159, 375 (1996).
4. M. Selvaraj, A. Pandurangan, K.S. Seshadri, P.K. Sinha, V. Krishnasamy, and K.B. Lal, J. Molecular. Catal. A: Chemical. 186, 173 (2002);
5. (b) S.K. Jana, H. Takahashi, M. Nakamura, M. Kaneko, R. Nishida, H. Shimizu, T. Kugita, and S. Namba, Appl. Catal. A: General 245, 33 (2003).
6. D. Zhao, J. Feng, Q. Huo, N. Melosh, G.H. Fredrickson, B.F. Chmelka, and G.D. Stucky, Science (Washington, D.C.) 279, 548 (1998);
7. (b) D. Zhao, Q. Huo, J. Feng, B.F. Chmelka, and G.D. Stucky, J. Am. Chem. Soc. 120, 6024 (1998).
8. Y. Yue, A. Cedeon, J.L. Bonardet, N. Melosh, J.B.D'Esinose, and J. Fraissard, Chem. Commun. 1967 (1999).
9. (b) A. Cedeon, A. Lassoued, J.L. Bonardet, and J. Fraissard, Micro. Meso. Mater. 801, 44 (2001).
10. W.H. Zhang, J. Lu, B. Han, M. Li, J. Xiu, P. Ying, and C. Li, Chem. Mater. 14, 3413 (2002).
11. Y. Li, W.H. Zhang, L. Zhang, Q.H. Yang, Z.B. Wei, Z.C. Feng, and C. Li, J. Phys. Chem. B 108, 9739 (2004).
12. S. Wu, Y. Han, Y.C. Zou, J.W. Song, L. Zhao, Y. Di, S.Z. Liu, and P.S. Xiao, Chem. Mater. 16, 486 (2004).
13. Vinu, V. Murugesan, W. Böhlmann, and M. Hartmann, J. Phys. Chem. B 108, 11496 (2004).
14. W. Li, S. Huang, S. Liu, and M.O. Coppens, Langmuir 21, 2078 (2005).
15. C.G. Lugmair, K.L. Fujdala, and T.D. Tilley, Chem. Mater. 14, 888 (2002).
16. K.L. Fujdala and T.D. Tilley, Chem. Mater. 14, 1376 (2002).
17. K.L. Fujdala and T.D. Tilley, Chem. Mater. 13, 1817 (2001).
18. K.L. Fujdala and T.D. Tilley, J. Am. Chem. Soc. 123, 10133 (2001).
19. M.P. Coles, C.G. Lugmair, and K.W. Terry, Chem. Mater. 12, 122 (2000).
20. J.B. Miller, E.R. Tabone, and E.I. Ko, Langmuir 12, 2878 (1996).
21. K.S.W. Sing, D.H. Everett, R.A.W. Haul, L. Moscow, R.A. Pierotti, and J. Ronquerol, Pure Appl. Chem. 57, 603 (1985).
22. J.L. Blin, A. Le'onard, and B.L. Su, J. Phys. Chem. B 105, 6070 (2001).
23. E.P. Parris, J. Catal. 2, 371 (1963).
24. C.A. Emeis, J. Catal. 141, 347 (1993).