Amorphous Silicon Nitride: a suitable alloy for optical multilayered structures

Journal of Non-Crystalline Solids

Volumn 352, Issue 9-20 SPEC. ISS., 2006, Pages 1294-1297

  Ricciardi, C ^a   Ballarini, V ^a   Galli, M ^b   Liscidini, M ^b   Andreani, L C ^b   Losurdo, M ^c   Bruno, G ^c   Lettieri, S ^d   Gesuele, F ^d   Maddalena, P ^d   Giorgis, F ^a  

^a POLITECNICO DI TORINO   (Italy)

^b UNIVERSITY OF PAVIA   (Italy)

^c CNR   (Italy)

^d UNIVERSITY OF NAPLES FEDERICO II   (Italy)

Author keywords

Amorphous semiconductors; Ellipsometry; Optical properties; Optical spectroscopy; Plasma deposition; Silicon

Indexed keywords

AMORPHOUS MATERIALS; ELLIPSOMETRY; INTERFEROMETRY; MULTILAYERS; OPTICAL PROPERTIES; SILICON;

AMORPHOUS SEMICONDUCTORS; OPTICAL SPECTROSCOPY; PLASMA DEPOSITION;

SILICON NITRIDE;

EID: 33744517006     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.10.056     Document Type: Article

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