Application of a High Density Inductively Coupled Plasma Reactor to Polysilicon Etching

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 11, Issue 4, 1993, Pages 1296-1300

  Patrick, Roger ^a   Schoenborn, Philippe ^a   Toda, Harry ^a   Bose, Frank ^b  

^a AGERE SYSTEMS   (United States)

^b ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33646924965     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.578542     Document Type: Conference Paper

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