Development and fabrication of magnetic thin films

Microsystem Technologies

Volumn 12, Issue 7, 2006, Pages 655-658

  Bedenbecker, M ^a   Bandorf, R ^b   Luethje, H ^b   Braeuer, G ^b   Gatzen, H H ^a  

^a LEIBNIZ UNIVERSITY HANNOVER   (Germany)

^b FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETISM; ELECTROPLATING; MAGNETIC FLUX; MAGNETIC MATERIALS; MICROACTUATORS; NICKEL ALLOYS;

DEPOSITION RATES; DEPOSITION TECHNOLOGIES; GAS FLOW SPUTTERING;

MAGNETIC THIN FILMS;

EID: 33646917854     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-006-0093-3     Document Type: Article

References (6)

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2. Kim D, Park D-Y, Yoo BY, Sumodjo PTA, Myung NV (2003) Magnetic properties of nanocrystallite iron group thin film alloys electrodeposited from sulfate and chloride baths. Electrochim Acta 48:819-830
3. Ortner K, Birkholz M, Jung T (2003) Neue Entwicklungen beim Hohlkathoden-Gasflusssputtern. Vakuum Forsch Prax 5:236239
4. Osaka T, Yokoshima T, Shiga D, Imai K, Takashima K (2003) A high moment CoFe soft magnetic thin film prepared by electrodeposition. Electrochem Solid State Lett 6(4):C53-C55
5. Prados C, Hernando A (1999) Coercivity analysis in sputtered SmCo thin films. J Appl Phys 85(8):6148-6150
6. Wurz MC, Dinulovic D, Gatzen HH (2004) Investigation of permeability on electroplated and sputtered permalloy. In: 206nd Meeting of The Electrochemical Society, Honolulu, Hawaii L2 1175, Meeting Abstracts