Time delay effect on a positive deep UV resist using partially tetrahydropyranyl-protected polyvinylphenol

Journal of Photopolymer Science and Technology

Volumn 6, Issue 4, 1993, Pages 497-504

  Hattori, Takashi ^a   Schlegel, Leo ^a   Imai, Akira ^a   Hayashi, Nobuaki ^a   Ueno, Takumi ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33646912071     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.6.497     Document Type: Article

References (9)

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