Characterization of sulfur, selenium and tellurium sensitization centers and sensitization mechanisms

2005 Beijing International Conference on Imaging: Technology and Applications for the 21st Century

Volumn 2005, Issue , 2005, Pages 56-57

  Morimura, Kimiyasu ^a   Sasaki, Hirotomo ^a   Kojima, Tetsuro ^a   Ihama, Mikio ^a   Yamashita, Seiji ^a   Tani, Tadaaki ^a   Mifune, Hiroyuki ^a  

^a FUJIFILM CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TRAPS; EMULSIONS; SELENIUM; TELLURIUM;

AGBR EMULSION GRAINS; RECIPROCITY-LAW BEHAVIOR; SENSITIZATION CENTERS;

SULFUR;

EID: 33646908025     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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