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Volumn 99, Issue 9, 2006, Pages

Sub-meV photoluminescence linewidth and > 106 cm 2/Vs electron mobility in AlGaAsGaAs quantum wells grown by metalorganic vapor phase epitaxy on slightly misoriented substrates

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON MOBILITY; EPITAXIAL GROWTH; IMPURITIES; METALLORGANIC VAPOR PHASE EPITAXY; MOLECULAR BEAM EPITAXY; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; SEMICONDUCTING GALLIUM; SEMICONDUCTOR QUANTUM WELLS; SUBSTRATES; TRANSPORT PROPERTIES;

EID: 33646895712     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2195370     Document Type: Article
Times cited : (33)

References (30)
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    • Special precautions were taken to avoid oxidation of the AlGaAs surface, by keeping these samples in a 6N nitrogen glove box before the AFM measurements. The samples were measured within a few hours from air exposure.
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    • A word of caution on this point is needed. The annealed cap morphologies do not necessarily reproduce the buried interface morphologies, as reported in Ref. on "perfectly" oriented samples. On weakly misoriented substrates, however, we found that a strong correlation exists between the cap morphologies as measured by AFM and the buried interfaces morphology [N. Moret, D. Y. Oberli, E. Pelucchi, N. Gogneau, A. Rudra, and E. Kapon, Appl. Phys. Lett. 88, 141917 (2006)].
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