Etch rate modification of SiO2 by ion damage

Electrochemical and Solid-State Letters

Volumn 9, Issue 7, 2006, Pages

  Charavel, R ^a   Raskin, J P ^a  

^a UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CATALYSTS; ETCHING; HYDROFLUORIC ACID; ION IMPLANTATION; OXIDES; REACTION KINETICS;

AQUEOUS SOLUTION SELECTIVITY; ETCH RATE; ION DAMAGES; UNIMPLANTED OXIDES;

SILICA;

EID: 33646883326     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2200307     Document Type: Article

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