Metalorganic chemical vapor deposition and characterization of ZnO materials

Journal of Electronic Materials

Volumn 35, Issue 4, 2006, Pages 766-770

  Sun, Shangzu ^a   Tompa, Gary S ^a   Hoerman, Brent ^a   Look, David C ^b   Claflin, Bruce B ^b   Rice, Catherine E ^a   Masaun, Puneet ^a  

^a STRUCTURED MATERIALS INDUSTRIES INC   (United States)

^b WRIGHT STATE UNIVERSITY   (United States)

Author keywords

Metalorganic chemical vapor deposition (MOCVD); Transparent conducting oxide; Wide bandgap; ZnO

Indexed keywords

BIOCHEMICAL SENSING; METALORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); TRANSPARENT CONDUCTING OXIDE; WIDE BANDGAP;

FILM GROWTH; HALL EFFECT; HEAT TREATMENT; LIGHTING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITROGEN COMPOUNDS; OPTOELECTRONIC DEVICES; PHOTOLUMINESCENCE;

ZINC OXIDE;

EID: 33646741253     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-006-0136-7     Document Type: Conference Paper

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