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Volumn 19, Issue 6, 2006, Pages

An interface diffusion process approach for the fabrication of MgB 2 wire

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CURRENT DENSITY; DIFFUSION; IRON ALLOYS; MAGNETIC FIELD EFFECTS; SILICON CARBIDE;

EID: 33646729080     PISSN: 09532048     EISSN: 13616668     Source Type: Journal    
DOI: 10.1088/0953-2048/19/6/L01     Document Type: Article
Times cited : (27)

References (12)
  • 7
    • 33646729670 scopus 로고
    • Tachikawa K 1970 Proc. ICEC-III (Guilford, UK: Berlin, Illiffe Science and Technology Publications) p 339
    • (1970) Proc. ICEC-III , pp. 339
    • Tachikawa, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.