Correlation between structure and optical properties of Si-based alloys deposited by PECVD

Thin Solid Films

Volumn 511-512, Issue , 2006, Pages 598-602

  Giangregorio, M M ^a   Losurdo, M ^a   Sacchetti, A ^a   Capezzuto, P ^a   Bruno, G ^a  

^a CNR   (Italy)

Author keywords

a Si; Ellipsometry; PECVD

Indexed keywords

ELLIPSOMETRY; MICROSTRUCTURE; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPECTROSCOPIC ANALYSIS; THIN FILMS;

A-SI; MATERIAL MICROSTRUCTURE; PECVD; SPECTROSCOPIC ELLIPSOMETRY;

SILICON ALLOYS;

EID: 33646594414     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.11.098     Document Type: Article

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